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SiO2/Si基Ca0.4Sr0.6Bi4Ti4O15薄膜的制备及C-V特性研究

作者:时间:2014-10-09点击数:

PDF全文下载:2011060560

董蓬超, 范素华, 张丰庆, 陈杨

 (山东建筑大学 材料科学与工程学院, 山东 济南 250101)

 摘要:

利用sol-gel方法在SiO2/Si基板上制备了Ca0.4Sr0.6Bi4Ti4O15(CSBT)铁电薄膜,其中Si(100)为P型。利用XRD、SEM测试手段研究了CSBT铁电薄膜的结构与形貌,测试了Au/CSBT/SiO2/Si/Au结构的介电特性和C-V曲线。

关键词:

CSBT铁电薄膜; 层层退火; 择优取向; C-V特性

 中图分类号: X 937文献标志码: A

 Preparation and C-V Characteristics of Ca0.4Sr0.6Bi4Ti4O15 Thin Films Deposited on SiO2/Si Substrate

 DONG Peng-chao, FAN Su-hua, ZHANG Feng-qing, CHEN Yang

 (School of Materials Science and Engineering, Shandong Jianzhu University, Ji’nan 250101,China)

 Abstract:

Ca0.4Sr0.6Bi4Ti4O15(CSBT)were preparated on SiO2/Si substracte by sol-gel method, and Si(100) was P type. The strctural characteristic and micrographs of CSBT ferroelectric thin films were examined by XRD and SEM. The metal-ferroelectric-insulation-semiconductor-metal structure showed that the dielectric properties and capacitance-voltage hysteresis was fine.

 Key words:

CSBT ferroelectric thin film; sequential layer annealing method; dominated oritation; C-V characteristics

 收稿日期:2011-09-26

基金项目: 国家自然科学基金资助项目(50872075).

作者简介: 董蓬超(1986—),男,硕士研究生.

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